Electric Field Deposition of Smooth Films of Nanocrystals

Conventional methods of forming films composed of organic-capped nanocrystals, such as by solvent evaporation in dry casting and spin coating, usually result in films that are very rough over macroscopic distances, such as a mm. A new method of forming smooth films of nanocrystals over (at least) ~1 cm was developed by Professor Irving P. Herman and colleagues at the Columbia MRSEC. This involves application of a dc, uniform electric field across opposing electrodes in a solution of nanocrystals. A small fraction of the nanocrystals in solution are charged and move to the electrodes under the influence of the field. Smooth, robust films of CdSe nanocrystals, capped by TOPO, with tunable thickness, such as 0.7 micrometers, were formed using this electrophoretic method. The properties of the individual nanocrystals are retained in these electrophoretic films, and these films are more resistant to chemical attack than other films. By patterning the electrodes, spatially selective deposition of the CdSe nanocrystal films are formed, as seen in the accompanying SEM (scanning electron micrograph). The nanocrystal film has grown on the gold electrodes (gray regions) but not on the silicon dioxide (black) or on gold films not connected to the electrode (light gray). So far, patterns with dimensions as narrow as 1 micrometer have been selectively deposited. This method has been used to deposit smooth films of other nanoparticles also, such as maghemite (gamma-Fe2O3) nanocrystals, and of mixtures of different nanoparticles.


Posted November 18, 2002.

For more details contact Irving P. Herman